QUASES  
References

* Medtronic Inc., Minneapolis, USA
* Environmental and Molec. Science, Pacific North West Lab, Wa, USA
* Institute Sciencia de MAteriales, Sevilla, Spain
* Micron Technology Inc., Boise, USA
* Georgia Inst. of Technolugy, Textile and Fiber Engineering Dept, Atlanta, USA
* Physical electronics, Inc. Eden Prairie, Mn, USA
* SAMSUNG Adv. Inst. of Technol., Korea
* UMIST, University of Manchester Institute of Technology, U.K.
* MOTOROLA, Arizona, USA
* BAYER AG , Leverkusen, Germany
* Pharmacia & Upjohn, Stockholm, Sweden
* JEOL Ltd , Application and Research Center, Tokyo, Japan
* SHELL Research Ltd., England
* HP, Hewlett Packard Co., Corvallis, USA
* INTEL Corporation, Arizona, USA
* University of Illinois, Chicago, USA  
* PHILIPS Research Lab., Holland
* Brigham Young University, Utah, USA
* Technische Universität Ilmenau, Dept. of Nanotechnology, Germany
* Service de Physique et Chemie des Surfaces, CEA, Saclay, France
* University of Dayton, Ohio, USA
* Los Alamos National Laboratory, New Mexico, USA
* CORNING Inc., Science and Technol Group, NY, USA
* SUMITOMO METAL INDUSTRIES, Japan
* UNIV of WESTERN ONTARIO, Canada
* NTT Adv. Technol. Corporation, Japan
* Charles University, Prague, Czech Repulic
* NKK Corp. Applied Technol. Research Center, Japan
* IBM Speichersysteme Mainz GmbH, Germany
* Universität des Saarlandes, Saarbrücken, Germany
*  Università di Cagliari, Italy
* Institute of Nucelar Research, ATOMKI, Hungary
* ETH-Materials, Zürich, Schweiz
* Institute of Industrial Science, University of Tokyo, Japan
* Aeronautical and Marittime Research Lab., Melbourne, Australia
* Forschungsanlane Karlsruhe, Germany
* Technosoft Service, Romania
* Synchrotron Radiation Research Center, Hyogo, Japan
* Brno University of Technology, Czech Republic
* Foundation for Promotion of Material Science and Technol., Tokyo, Japan
* LISE, Univ. Notre Dame de la Paix, Namur, Belgium
* Utsunomiya University, Japan
* AEROSPATIALE, Suresnes, Paris, France
* JME Co Ltd., Tokyo, Japan
* ICI- PLC- Polymers group, Wilton, UK
* Reijers Computers, Eindhoven, Holland
* SUMITOMO Metal Industries Ltd, Hyogo, Japan
* SHELL Laboratories, Amsterdam, Holland
* NIST, National Institute of Standards and Technology, USA
* VG, Vacuum Generators Scientific, England
* National Institute of Materials and Chemical Research, Tsukuba, Japan
* Korea Research Institute of Standards and Science, South Korea
* EPFL, Ecole Polytechnique Federale de Lausanne, Schweiz
* Commissariat Energie Atomique, Saclay, France
* Institut Francais du Petrole, France
* NTT Advanced Technology Corporation, Japan
* IBM Speichersysteme Mainz GmbH, Germany
* NanoS- Science Park Odense, Denmark
* NKK Corporation, Japan
* ICI plc Technology, Wilton, UK
* INTEL - Ireland Collinstown, Ireland
* DSM Research, Geleen, Holland
* Center for Chemical Analysis- Helsinki University of Technology, Finland
* AWE - Atomic Weapons Establishment, Reading, UK
* Max Planck Institut für Plasma Physik, Garsching, Munic, Germany
* Science Center RISØ, Roskilde, Denmark
* CNRS-Universite H Poincare, LCPE Nancy, France
* Electrotechnical Laboratory, Tsukuba, Japan
* Fritz-Harber-Institut Der Max Planck Gesellschaft, Berlin, Germany 
* Argonne National Laboratory, Chicago, USA
* L.P.S.C. - CNRS, Meudon, France
* Forschungsanlage Karlsruhe, Germany
* National Institute of Materials and Chemistry, Tsukuba, Japan
* CSIRO , Victoria Australia
* Wright Patterson Air Force Base, Ohio, USA
* ICMBC Pessac, France
* BAM Bundesanstalt für Materialforschung und Prüfung, Berlin, Germany
* University of Fribourg, Switzerland
* Eindhoven University of Technology, Holland 
* Institut für Festkörper und Werkstofforschung, Dresden, Germany
* Chalmars University of Technology, Gothenburg, Sweden
* University of Dayton, Ohio, USA
* Murdoch University, Perth, Australia
* Kent State University, USA
* Toyama University, Japan
* Chemical Engineering, University of Maine, USA
* University of South Australia
* PAL Pohang University of Science and Technology, Korea
* Universität Osnabrück, Germany
* Northern Arizona University, USA
* Texas A&M University-Commerce, Texas, USA
* Ben Gurion University, Beer Sheva, Israel
* Universite de Mons-Hainot, Belgium
* Centrale National de la Recherche Scientifique, Villeneuve, France
* Technische Universität Kiel, Germany
* Technical University of Lisbon, Portugal
* Technical University of Denmark, Denmark
* Technische Universität Dresden, Germany
* Kent State University, Ohio, USA
* Universität Münster, Germany
* Technische Universität Wien, Austria
* Ecole Normale Superieure de Cachan, France
* Uppsala University, Sweden
* Universität Beyreuth, Germany
* University of York, England
* Institut des Materiaux de Nantes, France
* Weizmann Institute of Science, Israel
* Polish Academy of Sciences, Warsaw, Poland
* Institut de Physique et de Chimie des Materiaux de Strasbourg, France
* Laboratoire d'Etudes des Proprietés Electroniques des Solides, Grenoble, France
* Academy of Sciences of the Czech Republic, Prague, Czech Republic

 

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